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Hydrofluoric Acid (HF)
Hydrofluoric Acid (HF)
Hydrofluoric Acid (HF)

Electronic-grade hydrofluoric acid (HF) is a critical chemical in the electronics industry, widely used in precision manufacturing processes. It plays a central role in etching、cleaning and surface treatment of electronic components, leveraging its highly corrosive properties to efficiently remove silicon dioxide (SiO₂) layers and other contaminants.

With its exceptional precision-etching capabilities, electronic-grade HF enables the accurate formation of microstructures and patterns on substrates, making it an indispensable material in advanced electronics manufacturing.

Detailed introduction

Application：

-Semiconductor Industry

  • Removal of oxide layers from silicon surfaces, a critical step in semiconductor fabrication.

-Display Panel Industry

  • Glass thinning: HF dissolves SiO₂, making it essential for manufacturing ultra-thin glass panels.

-Steel Industry

  • Surface treatment: Removes oxygen-containing impurities from stainless steel surfaces.

-Solar Energy Industry

  • Wafer cleaning: Eliminates oxides and other contaminants from solar cell surfaces, ensuring high efficiency.
  • Silicon wafer etching

Advantage：

  • Customizable：Available in 25%, 49% and 50% to meet specific process requirements.
  • Packaging options：Tank Lorry、 IBC tote、200L drum、20L pail、gallon bottle
  • Metal Impurities ≤ 3 ppt
  • Particle control 0.03 µm
  • Precise concentration control (stable to decimal-level accuracy)
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