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Buffered Oxide Etchant (BOE)
Buffered Oxide Etchant (BOE)

Buffered Oxide Etchant (BOE) is a precisely formulated solution designed to control etching rates and enhance etching uniformity, primarily used for removing silicon dioxide (SiO₂) layers—a critical step in semiconductor manufacturing.

Chemical Reaction:

SiO₂ + 4HF + 2NHF (NH)SiF + 2H₂O

 

Detailed introduction

Key Applications

  • Dielectric Layer EtchingBOE precisely removes SiO dielectric layers while maintaining circuit integrity, essential for advanced node fabrication.
  • Surface CleaningEffectively eliminates surface contaminants, ensuring wafer purity during processing.

 

Advantage

  • Customizable Formulations
  • Ultra-High Purity (ppt-grade)
  • Flexible PackagingTank Lorry200L drum20L pailGallon bottle